Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure
Version of Record online: 31 JUL 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Plasma Processes and Polymers
Volume 5, Issue 7, pages 631–644, September 15, 2008
How to Cite
Girard-Lauriault, P.-L., Desjardins, P., Unger, W. E. S., Lippitz, A. and Wertheimer, M. R. (2008), Chemical Characterisation of Nitrogen-Rich Plasma-Polymer Films Deposited in Dielectric Barrier Discharges at Atmospheric Pressure. Plasma Processes Polym., 5: 631–644. doi: 10.1002/ppap.200800054
- Issue online: 3 SEP 2008
- Version of Record online: 31 JUL 2008
- Manuscript Accepted: 3 JUN 2008
- Manuscript Revised: 30 MAY 2008
- Manuscript Received: 10 MAR 2008
- Natural Sciences and Engineering Research Council of Canada (NSERC)
Options for accessing this content:
- If you are a society or association member and require assistance with obtaining online access instructions please contact our Journal Customer Services team.
- If your institution does not currently subscribe to this content, please recommend the title to your librarian.
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- New Users: Please register, then proceed to purchase the article.
Login via OpenAthens
Search for your institution's name below to login via Shibboleth.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!