Full Paper
Low-temperature Polymer Deposition in Ambient Air Using a Floating-electrode Dielectric Barrier Discharge Jet
Article first published online: 15 APR 2011
DOI: 10.1002/ppap.201000171
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Tsai, T.-C. and Staack, D. (2011), Low-temperature Polymer Deposition in Ambient Air Using a Floating-electrode Dielectric Barrier Discharge Jet. Plasma Processes Polym., 8: 523–534. doi: 10.1002/ppap.201000171
Publication History
- Issue published online: 28 JUN 2011
- Article first published online: 15 APR 2011
- Manuscript Accepted: 23 FEB 2011
- Manuscript Revised: 9 FEB 2011
- Manuscript Received: 17 NOV 2010
- Abstract
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Keywords:
- atmospheric pressure plasma deposition;
- dielectric barrier discharges (DBD);
- films;
- low-temperature deposition;
- plasma jet;
- plasma polymerization;
- PMMA
Abstract

Plasma-polymerized PMMA films were obtained by a low-temperature ambient deposition technique using a floating-electrode DBD jet with two distinct operation modes, namely a diffuse mode and a concentrated mode. Deposition rates, surface morphologies, atomic compositions, and chemical bond concentrations of the PMMA films showed a dependence on the modes. In the concentrated mode rapid deposition (22 nm · s−1) can be achieved with the substrate temperature merely rising to 39 °C. Besides transparent PMMA films with high quality, opaque films with wrinkled microstructures due to buckling effects were obtained. Similar functional groups to those in pure PMMA were also observed by both XPS and FTIR results. It was demonstrated that PMMA films can be successfully grown on different substrate materials, such as glass, plastic, rubber, onion skin, and fingernail.

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