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Surface Characterization of Atmospheric Pressure Plasma-Deposited Allyl Methacrylate and Acrylic Acid Based Coatings

Authors

  • Bernard Nisol,

    Corresponding author
    1. Faculty of Sciences, Analytical and Interfacial Chemistry, Université Libre de Bruxelles, 2, bd. du Triomphe, CP 255, B-1050 Brussels, Belgium
    • Université Libre de Bruxelles, Chimie analytique et chimie des interfaces, 2, bd. du Triomphe, CP 255, B-1050 Bruxelles, Belgium.
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  • Abdelkrim Batan,

    1. Faculty of Sciences, Analytical and Interfacial Chemistry, Université Libre de Bruxelles, 2, bd. du Triomphe, CP 255, B-1050 Brussels, Belgium
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  • François Dabeux,

    1. Faculty of Sciences, Analytical and Interfacial Chemistry, Université Libre de Bruxelles, 2, bd. du Triomphe, CP 255, B-1050 Brussels, Belgium
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  • Alexandros Kakaroglou,

    1. Research Group Electrochemical and Surface Engineering (SURF), Department of Materials and Chemistry (MACH), Vrije Universiteit Brussel, Pleinlaan 2, B-1050 Brussels, Belgium
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  • Iris De Graeve,

    1. Research Group Electrochemical and Surface Engineering (SURF), Department of Materials and Chemistry (MACH), Vrije Universiteit Brussel, Pleinlaan 2, B-1050 Brussels, Belgium
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  • Guy Van Assche,

    1. Research Group Physical Chemistry and Polymer Science, Department of Materials and Chemistry (MACH), Vrije Universiteit Brussel, Pleinlaan 2, B-1050 Brussels, Belgium
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  • Bruno Van Mele,

    1. Research Group Physical Chemistry and Polymer Science, Department of Materials and Chemistry (MACH), Vrije Universiteit Brussel, Pleinlaan 2, B-1050 Brussels, Belgium
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  • Herman Terryn,

    1. Research Group Electrochemical and Surface Engineering (SURF), Department of Materials and Chemistry (MACH), Vrije Universiteit Brussel, Pleinlaan 2, B-1050 Brussels, Belgium
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  • François Reniers

    1. Faculty of Sciences, Analytical and Interfacial Chemistry, Université Libre de Bruxelles, 2, bd. du Triomphe, CP 255, B-1050 Brussels, Belgium
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Abstract

This work deals with the plasma-deposition of allyl methacrylate (AMA) and acrylic acid (AA) on metallic substrates. The plasma setup used is an atmospheric pressure radio frequency (RF) torch. Infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS) are used as characterization tools. In addition, spectroscopic ellipsometry (SE) has been used to control the thickness and calculate the corresponding deposition rates. Whereas the surface chemistry of plasma deposited AMA does not seem to be influenced by the plasma power, acrylic acid based coatings are strongly degraded with the increasing power. AMA seems to allow an efficient polymerization, while at the same time is particularly resistant to plasma induced fragmentation in the range of power used.

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