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Different Polymerizing Characteristics of Ar/He Atmospheric Pressure Plasma Jets at Room Temperature

Authors

  • Xu Zheng,

    1. Key Laboratory of Advanced Textile Materials and Manufacturing Technology, Engineering Research Center for Eco-Dyeing and Finishing of Textiles, Ministry of Education, Zhejiang Sci-Tech University, Hangzhou 310018, China
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  • Guangliang Chen,

    Corresponding author
    1. Key Laboratory of Advanced Textile Materials and Manufacturing Technology, Engineering Research Center for Eco-Dyeing and Finishing of Textiles, Ministry of Education, Zhejiang Sci-Tech University, Hangzhou 310018, China
    • Key Laboratory of Advanced Textile Materials and Manufacturing Technology, Engineering Research Center for Eco-Dyeing and Finishing of Textiles, Ministry of Education, Zhejiang Sci-Tech University, Hangzhou 310018, China Fax: +86 571 86843250
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  • Zhaoxia Zhang,

    1. Key Laboratory of Advanced Textile Materials and Manufacturing Technology, Engineering Research Center for Eco-Dyeing and Finishing of Textiles, Ministry of Education, Zhejiang Sci-Tech University, Hangzhou 310018, China
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  • Guohua Lv,

    1. Key Laboratory of Soft Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
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  • Jennifer Beem,

    1. School of Chemical, Biological and Materials Engineering, University of Oklahoma, Norman 73019, USA
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  • Sylvain Massey,

    1. Groupe en Sciences des Radiations, Faculté de Médecine et des Sciences de la Santé, Université de Sherbrooke, Sherbrooke, Québec, Canada QC J1H 5N4
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  • Michael Tatoulian

    1. École Nationale Supérieure de Chimie de Paris – Chimie ParisTech, Laboratoire de Génie des Procédés Plasmas et Traitements de Surfaces, Université Pierre et Marie Curie, Paris 75005, France
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Abstract

In this paper, the different discharge and polymerizing characteristics of Ar and He atmospheric pressure plasma jets (APPJs) were studied. The as-deposited polymer of acrylic acid (PAA) on silk fibroin film (SFF) by APPJs with Ar/O2 and He/O2 gases is investigated with AFM, FESEM and XPS. Optical emission spectroscopy (OES) measurements indicated that various reactive radicals, such as OH and O as well as some acrylic acid (AA) particles existed in the plasma jets. AFM images showed that the He/O2 plasma-deposited films had the most homogeneous characteristics and good water resistance properties. The cross-sections of silicon substrates obtained by FESEM showed that the deposition rates of PAA were 50 nm · min−1 and 15 nm · min−1 for Ar/O2 and He/O2 plasmas, respectively. Also, according to XPS analysis, He/O2 plasma created a higher concentration of carboxyl groups on the deposited film than when Ar/O2 plasma was used.

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