Rapid Micro-Scale Patterning of Alkanethiolate Self-Assembled Monolayers on Au Surface by Atmospheric Micro-Plasma Stamp

Authors

  • Chih-Chiang Weng,

    1. Promotion Center for Global Materials Research, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
    2. Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
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  • Jen-Chih Hsueh,

    1. Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
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  • Jiunn-Der Liao,

    Corresponding author
    1. Promotion Center for Global Materials Research, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
    2. Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
    • Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan.
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  • Chia-Hao Chen,

    1. National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu Science Park, Hsichu 30076, Taiwan
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  • Masahiro Yoshimura

    1. Promotion Center for Global Materials Research, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
    2. Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan
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Abstract

A dielectric barrier discharge-based micro-plasma stamp is used to transfer a micro-scale pattern onto ultra-thin octadecanethiolate (ODT) self-assembled monolayers chemically adsorbed on Au (111). The results show that the specified pattern was transferred onto ODT/Au with a distortion rate of less than 1% and no significant changes in the imprint dimensions. The adsorbates formed during plasma treatment or exposure to air affected the transfer of patterns. The wet-etching rate for the washed and patterned ODT/Au surface increased 1.6-fold compared to that for the unwashed one. The boundary of the underlaying Au pattern with plasma exposure increased ≈3% due to lateral diffusion of the Au etching solution.

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