On the “Growth” of Nano-Structures on c-Silicon via Self-Masked Plasma Etching Processes
Version of Record online: 2 JUL 2013
© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Plasma Processes and Polymers
Volume 10, Issue 10, pages 843–849, October 2013
How to Cite
Di Mundo, R., Palumbo, F., Barucca, G., Sabato, G. and d'Agostino, R. (2013), On the “Growth” of Nano-Structures on c-Silicon via Self-Masked Plasma Etching Processes. Plasma Processes Polym., 10: 843–849. doi: 10.1002/ppap.201300031
- Issue online: 9 OCT 2013
- Version of Record online: 2 JUL 2013
- Manuscript Accepted: 21 MAY 2013
- Manuscript Revised: 15 MAY 2013
- Manuscript Received: 9 MAR 2013
- Apulia Region fundings “Laboratorio Pubblico di Ricerca Industriale Pugliese dei Plasmi, LIPP”
- Sensori e Micro-lavorazioni Laser per Applicazioni Motoristiche e Manifatturiere, DM01.01
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