Plasma Processes and Polymers

Cover image for Vol. 9 Issue 11‐12

December 2012

Volume 9, Issue 11-12

Pages 1035–1214

  1. Cover Picture

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
    1. Plasma Process. Polym. 11–12/2012

      Michael Thomas, Jochen Borris, Antje Dohse, Marko Eichler, Alena Hinze, Kristina Lachmann, Krees Nagel and Claus-Peter Klages

      Version of Record online: 4 DEC 2012 | DOI: 10.1002/ppap.201290031

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      Cover: Local plasma treatment at atmospheric pressure of a 100 mm diameter silicon wafer carrying a wet-chemically etched topography with a height difference of 50 μm between recessed and elevated areas. Further details can be found in the article by Thomas et. al. on page 1086.

  2. Masthead

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
    1. Plasma Process. Polym. 11–12/2012

      Version of Record online: 4 DEC 2012 | DOI: 10.1002/ppap.201290032

  3. Contents

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
  4. Editorial

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
  5. Review

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
    1. Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition (pages 1041–1073)

      Francoise Massines, Christian Sarra-Bournet, Fiorenza Fanelli, Nicolas Naudé and Nicolas Gherardi

      Version of Record online: 7 AUG 2012 | DOI: 10.1002/ppap.201200029

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      The aim of this review is to contribute to find a solution for AP-PECVD of dense film at a growth rate suitable for industrial applications. It compares the different plasma sources, the different reactor configurations, power supplies, precursors nature to try to point out advantages and drawbacks, and converge to the best solution.

  6. Feature Articles

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
    1. Plasma–Liquid Interactions at Atmospheric Pressure for Nanomaterials Synthesis and Surface Engineering (pages 1074–1085)

      Davide Mariotti, Jenish Patel, Vladimir Švrček and Paul Maguire

      Version of Record online: 6 AUG 2012 | DOI: 10.1002/ppap.201200007

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      Atmospheric pressure plasmas that interact with liquids exhibit interesting phenomena that induce chemical reactions in a wide range of solutions. Plasma-induced non-equilibrium liquid chemistry offers new exciting avenues for the activation of chemical reactions in solution with interesting implications for traditional wet chemistry. Here opportunities for nanomaterial synthesis and surface engineering are highlighted.

    2. Plasma Printing and Related Techniques – Patterning of Surfaces Using Microplasmas at Atmospheric Pressure (pages 1086–1103)

      Michael Thomas, Jochen Borris, Antje Dohse, Marko Eichler, Alena Hinze, Kristina Lachmann, Krees Nagel and Claus-Peter Klages

      Version of Record online: 3 SEP 2012 | DOI: 10.1002/ppap.201200020

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      Non-equilibrium microplasmas generated at atmospheric pressure are the central tools to carry out direct surface patterning by area-selective plasma-based etching, chemical modification, or coating in plasma printing and related processes. With suitable “plasma stamps” two and three dimensional substrates can be structured. Minimum structure widths produced so far are 10 µm.

    3. Atmospheric Pressure Deposition of Thin Functional Coatings: Polymer Surface Patterning by DBD and Post-Discharge Polymerization of Liquid Vinyl Monomer from Surface Radicals (pages 1104–1115)

      Jean-Pascal Borra, Alexandre Valt, Farzi Arefi-Khonsari and Michael Tatoulian

      Version of Record online: 12 SEP 2012 | DOI: 10.1002/ppap.201100210

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      We present a route for grafting dense poly-acid and poly-ether coatings on polymers by post-discharge polymerization of liquid monomer. Surface modifications of polymer films due to the initial treatment by micro-discharges in air DBD (sub-µm craters and homogeneous surface properties) and post-DBD polymerization mechanism of liquid vinyl monomer triggered by surface radicals are depicted.

  7. Full Papers

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Editorial
    6. Review
    7. Feature Articles
    8. Full Papers
    1. The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure (pages 1116–1124)

      Rüdiger Reuter, Katja Rügner, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell and Jan Benedikt

      Version of Record online: 5 JAN 2012 | DOI: 10.1002/ppap.201100146

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      The role of oxygen and surface reactions in the deposition of SiO2-like films from HMDSO at atmospheric pressure have been investigated. It is found that surface reactions with most probably atomic oxygen, but also excited argon species (metastables, ions) can be reasonable for the carbon loss in deposition applications.

    2. Localized Growth of Silicon Oxide Nanowires by Micro-Afterglow Oxidation (pages 1125–1131)

      Grégory Arnoult, Thomas Gries, Gérard Henrion, Sylvie Migot, Vincent Fournée and Thierry Belmonte

      Version of Record online: 2 MAR 2012 | DOI: 10.1002/ppap.201100191

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      Silicon oxide nanowires (SiONWs) can be grown by a non-catalytic process by applying a micro-afterglow on a silicon surface or even on binary Fe–Si alloys. This growth process occurs below 523 K. We suggest it is based on the emergence of a surface defect enabling outward diffusion of silicon. Stress induced by the growth of one SiONW creates new defects and a bundle of SiONWs grows circularly.

    3. Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors (pages 1132–1143)

      Fiorenza Fanelli, Sara Lovascio, Riccardo d'Agostino and Francesco Fracassi

      Version of Record online: 13 MAR 2012 | DOI: 10.1002/ppap.201100157

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      This work deals with the atmospheric pressure PE-CVD of thin films using DBDs fed with argon, oxygen and different methyldisiloxanes. Results form the investigation of the chemical composition and structure of the deposits, as well as from the qualitative and quantitative analysis of the exhaust gas, are exploited to rise hypotheses on the overall deposition mechanism and on the organosilicon plasma chemistry at atmospheric pressure.

    4. Synthesis of Membrane-Electrode Assembly for Fuel Cells by Means of (Sub)-Atmospheric Plasma Processes (pages 1144–1153)

      Delphine Merche, Thierry Dufour, Julie Hubert, Claude Poleunis, Sami Yunus, Arnaud Delcorte, Patrick Bertrand and François Reniers

      Version of Record online: 13 APR 2012 | DOI: 10.1002/ppap.201100208

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      In order to develop membrane electrode assembly for PEMFC, thermally stable pp-sulfonated polystyrene are synthesized by DBD directly on carbon substrates decorated with Pt nanoparticles. The carbon substrates are decorated by spraying a platinum colloidal solution in the post-discharge of an atmospheric plasma-torch. This two-steps plasma process could constitute an alternative approach for the synthesis of fuel cells.

    5. Plasma-Induced Damage and Surface Functionalization of Double-Walled Carbon Nanotubes Using Atmospheric Pressure RF Discharge (pages 1154–1159)

      Tomohiro Nozaki, Shinpei Yoshida and Ken Okazaki

      Version of Record online: 3 JUL 2012 | DOI: 10.1002/ppap.201100218

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      Synthesis and chemical functionalization of double-walled carbon nanotubes were investigated using atmospheric pressure RF discharge. Covalent CH functional group was readily created near the top layer of CNTs when H2/O2 containing plasma was irradiated. CNT growth, formation of functional group, and plasma-induced damage are mutually related and their mechanisms are experimentally clarified.

    6. Area-Selective Microplasma Treatment in Microfluidic Channels for Novel Fluid Phase Separators (pages 1160–1167)

      Marko Eichler, Krees Nagel, Philipp Hennecke and Claus-Peter Klages

      Version of Record online: 18 JUN 2012 | DOI: 10.1002/ppap.201200006

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      Atmospheric pressure plasmas enable all side inner coatings of microchannels in fluidic systems. This process allows to produce, within a few seconds, a fluidic separators for multi-phase mixtures from a monolithic Y-channel mixer. By using a parallel arrangement of several separators, the flow capacity is easily scalable. The separation process is based on the different surface tension of the fluid phases.

    7. Deposition of Hydrophobic Functional Groups on Wood Surfaces Using Atmospheric-Pressure Dielectric Barrier Discharge in Helium-Hexamethyldisiloxane Gas Mixtures (pages 1168–1175)

      Olivier Levasseur, Luc Stafford, Nicolas Gherardi, Nicolas Naudé, Vincent Blanchard, Pierre Blanchet, Bernard Riedl and Andranik Sarkissian

      Version of Record online: 30 JUL 2012 | DOI: 10.1002/ppap.201100222

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      This work examines the functionalization of wood surfaces using organosilicon plasmas at atmospheric-pressure. Plasma-treated wood samples showed water contact angles in the 120°–140° range due to the deposition of hydrophobic SiOCH functional groups. Relatively thick coatings (∼200 nm) exhibited high dimensional stability, a promising result for structural and decorative outdoor applications.

    8. Plasma Deposition of PEO-Like Coatings with Aerosol-Assisted Dielectric Barrier Discharges (pages 1176–1183)

      Gabriella Da Ponte, Eloisa Sardella, Fiorenza Fanelli, Riccardo d'Agostino, Roberto Gristina and Pietro Favia

      Version of Record online: 18 JUL 2012 | DOI: 10.1002/ppap.201100201

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      Deposition of PEO-like coatings is achieved using DBDs fed with TEGDME organic precursor aerosols in helium gas. The deposition process is efficiently controlled to obtain coatings with variable PEO character, from 50% (cell adhesive) to 70% (nonfouling), by simply tuning plasma parameters such as aerosol/carrier flow ratio, frequency of the electric field applied and input power.

    9. New Insights into Plasma-Assisted Dissociation of Organometallic Vapors for Gas-Phase Synthesis of Metal Nanoparticles (pages 1184–1193)

      Pin Ann Lin, Ajay Kumar and R. Mohan Sankaran

      Version of Record online: 25 JUL 2012 | DOI: 10.1002/ppap.201100216

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      Gas-phase nucleation of metal nanoparticles in a microplasma jet from different organometallic vapor precursors is elucidated by a combination of in situ and ex situ methods. Metal nanoparticles synthesized from metallocene compounds such as Ni are found to produce carbon-free material while those produced from acetylacetonate compounds such as Cu contain significant amounts of carbon. The new insights could guide the development of aerosol processes for metal nanoparticle synthesis.

    10. Surface Dynamics of SiO2-like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure (pages 1194–1207)

      Peter Antony Premkumar, Sergey A. Starostin, Hindrik de Vries, Mariadriana Creatore, Paul M. Koenraad, William A. MacDonald and Mauritius C. M. van de Sanden

      Version of Record online: 6 JUL 2012 | DOI: 10.1002/ppap.201200016

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      AFM surface dynamics analysis carried out on AP-PECVD grown SiO2-like films on polymers show films grow in a conformal and self-similar way following the topology of the substrate, observed as in the growth of ALD oxide films. The estimated scaling exponents show that the surface growth does not belong to the universality classes theoretically predicted by the statistical growth models. The prepared smooth SiO2-like films could be beneficial for several industrial applications.

    11. Reduction of Plasticizer Leaching from PVC by Barrier Coatings Deposited Using DBD Processes at Atmospheric Pressure (pages 1208–1214)

      Mercedes Cerezuela Barreto, Jochen Borris, Michael Thomas, Renate Hänsel, Michael Stoll and Claus-Peter Klages

      Version of Record online: 3 DEC 2012 | DOI: 10.1002/ppap.201200005

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      A high barrier performance against plasticizer leaching has been achieved with an OMCTS-based coating below 200 nm using PACVD-DBD at atmospheric pressure. The highest reduction in plasticizer leaching on plasticized polyvinylchloride, higher than 80%, is achieved by coatings with a C/Si ratio of 1. Coatings with a lower organic content show a lower effectiveness due to crack formation, while a higher organic content result in a decreased barrier effectiveness.

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