Plasma Processes and Polymers

Cover image for Vol. 9 Issue 8

August 2012

Volume 9, Issue 8

Pages 747–829

  1. Cover Picture

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Full Papers
    1. Plasma Process. Polym. 8/2012

      G. Dingemans, M. C. M. van de Sanden and W. M. M. Kessels

      Version of Record online: 8 AUG 2012 | DOI: 10.1002/ppap.201290022

      Thumbnail image of graphical abstract

      Cover: μ-PCD plots showing the effective lifetime for two halves of 4 inch wafers deposited using different pulse intervals Δt –left: after annealing at 400 °C, right: after subsequent firing (T > 800 °C) in an industrial belt line furnace. Further details can be found in the article by G. Dingemans, R. van de Sanden, and E. Kessels* on page 761.

  2. Masthead

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Full Papers
    1. Plasma Process. Polym. 8/2012

      Version of Record online: 8 AUG 2012 | DOI: 10.1002/ppap.201290023

  3. Contents

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Full Papers
    1. Plasma Process. Polym. 8/2012 (pages 747–749)

      Version of Record online: 8 AUG 2012 | DOI: 10.1002/ppap.201290021

  4. Review

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Full Papers
    1. The Use of Non-Equilibrium Plasmas for the Synthesis of Heterogeneous Catalysts (pages 750–760)

      Toon Witvrouwen, Sabine Paulussen and Bert Sels

      Version of Record online: 13 APR 2012 | DOI: 10.1002/ppap.201200004

      Thumbnail image of graphical abstract

      Plasma-assisted synthesis of heterogeneous catalysts, both films and powders, is still under thorough investigation in the plasma research field. However, like this review will show, the field proves to be very promising, because of the ability to work without solvents and at low temperature, while the reactivity in the plasma is more than sufficient to produce or treat highly dispersed catalysts with high activity and stability.

  5. Full Papers

    1. Top of page
    2. Cover Picture
    3. Masthead
    4. Contents
    5. Review
    6. Full Papers
    1. Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses (pages 761–771)

      G. Dingemans, M. C. M. van de Sanden and W. M. M. Kessels

      Version of Record online: 24 APR 2012 | DOI: 10.1002/ppap.201100196

      Thumbnail image of graphical abstract

      Pulsed-flow PECVD is introduced as a novel PECVD process. Pulsing the precursor using ultrashort doses (10–50 ms) gives rise to a cyclic growth-mode with enhanced control over film properties, and leads to higher growth rates than plasma-assisted ALD. Its unique features are demonstrated by the synthesis of aluminum oxide thin films and the film growth mechanism is discussed.

    2. Pre-polymerization Kinetics in Continuous and Pulsed Glow Discharge in Tetrafluoroethylene (pages 772–781)

      Alena V. Andreeva, Ilya Kutsarev, Alexander V. Shatsky, Alexander M. Shterenberg and Vladislav I. Zyn

      Version of Record online: 30 MAY 2012 | DOI: 10.1002/ppap.201100204

      Thumbnail image of graphical abstract

      Molecular kinetics in a batch plasma polymerization system shows parallel formation of variety of molecules with wide spectrum of masses. Such rather strange result is caused by certain structure of the reaction when the multichannel synthesis of new molecules has a rate much higher than the preliminary electron activation which slows the total reaction more than 100 times.

    3. PEO-like Plasma Polymers Prepared by Atmospheric Pressure Surface Dielectric Barrier Discharge (pages 782–791)

      Ivan Gordeev, Andrei Choukourov, Milan Šimek, Václav Prukner and Hynek Biederman

      Version of Record online: 13 APR 2012 | DOI: 10.1002/ppap.201100213

      Thumbnail image of graphical abstract

      The non-fouling poly(ethylene oxide)-like plasma polymer films are prepared by atmospheric pressure amplitude-modulated AC surface dielectric barrier discharge in Ar environment with di(ethylene glycol) vinyl ether vapours. The good protein resistance properties of deposits are detected by QCM analysing instrument which are consistent with the XPS and FTIR data.

    4. Disinfection Through Different Textiles Using Low-Temperature Atmospheric Pressure Plasma (pages 792–798)

      Julia L. Zimmermann, Tetsuji Shimizu, Veronika Boxhammer and Gregor E. Morfill

      Version of Record online: 24 MAY 2012 | DOI: 10.1002/ppap.201100178

      Thumbnail image of graphical abstract

      The inactivation of Escherichia coli covered by different textiles was demonstrated using cold atmospheric plasma. The plasma was produced by a surface micro-discharge electrode and it was clearly shown that the bacteria covered in packages were inactivated already for short treatment times. We found that the investigated textiles only have a small effect on the bactericidal efficiency of the plasma.

    5. Deposition and Characterisation of Plasma Polymerised Allyl Methacrylate Based Coatings (pages 799–807)

      Alexandros Kakaroglou, Gill Scheltjens, Bernard Nisol, Iris De Graeve, Guy Van Assche, Bruno Van Mele, Rudolph Willem, Monique Biesemans, François Reniers and Herman Terryn

      Version of Record online: 30 MAY 2012 | DOI: 10.1002/ppap.201100162

      Thumbnail image of graphical abstract

      Allyl methacrylate deposited using atmospheric dielectric barrier discharge plasma. Infrared and nuclear magnetic resonance spectroscopy show that both allyl and vinyl moieties are polymerised during deposition. This suggests a formation of a crosslinked organic film that can be used as intermediate between aluminium and polyester topcoat. Pull-off tests show a promising adhesion performance.

    6. The Diffusion-reaction Model on the Wettability Gradient Created by SF6 Plasma (pages 808–819)

      Dave Mangindaan, Chang-Cheng Kuo, Shi-Yow Lin and Meng-Jiy Wang

      Version of Record online: 18 MAY 2012 | DOI: 10.1002/ppap.201100186

      Thumbnail image of graphical abstract

      A diffusion-reaction model for the gradient fabrication by SF6 plasma processing is elucidated which describes the complex phenomena of the surface physical and surface-chemical phenomenon. The numerical simulation on the profile of fluorine concentration (a) and water contact angle (b) along the gradient allowed the calculation of the required plasma treatment times for creation of different gradients precisely.

    7. PTFE Surface Etching in the Post-discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species (pages 820–829)

      Thierry Dufour, Julie Hubert, Pascal Viville, Corinne Y. Duluard, Simon Desbief, Roberto Lazzaroni and François Reniers

      Version of Record online: 30 MAY 2012 | DOI: 10.1002/ppap.201100209

      Thumbnail image of graphical abstract

      Poly(tetrafluoroethylene) (PTFE) surfaces have been texturized at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium and oxygen gases. An etching mechanism of the surface has been highlighted by correlating the mass losses measurements to the ejection of CF2 fragments from the PTFE surface and to an increase in the surface hydrophobicity.

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