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Keywords:

  • 85.40.Hp;
  • 87.64.Cc

Abstract

Spectroscopic ellipsometry measurement of periodic structures (“scatterometry”) has become a standard method for critical dimension and topography measurement in the integrated circuit industry. As dimensions are reduced, this method may not be adequate for research and process control. Use of immersion mode measurements may extend the usefulness of near UV specular scatterometry. In this paper, we present the first experimental measurements of gratings in water immersion and discuss the issues in achieving improved nano-topography measurements with this method. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)