Role of oxygen additive on hydrogen impurity incorporation in nanocrystalline diamond films fabricated by microwave plasma chemical vapor deposition
Article first published online: 27 JUL 2009
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 206, Issue 12, pages 2816–2821, December 2009
How to Cite
Tang, C. J., Gu, L. P., Grácio, J. and Ribeiro, J. L. (2009), Role of oxygen additive on hydrogen impurity incorporation in nanocrystalline diamond films fabricated by microwave plasma chemical vapor deposition. Phys. Status Solidi A, 206: 2816–2821. doi: 10.1002/pssa.200925147
- Issue published online: 7 DEC 2009
- Article first published online: 27 JUL 2009
- Manuscript Accepted: 18 JUN 2009
- Manuscript Revised: 1 APR 2009
- Manuscript Received: 30 DEC 2008
- Foundation of Science and Technology (FCT), Portugal
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