Unique structure of ZnO films deposited by chemical bath deposition

Authors

  • Dewei Chu,

    Corresponding author
    1. National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Anagahora, Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan
    • Phone: +81 52-736-7238, Fax: +81 52-736-7234
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  • Yoshitake Masuda,

    1. National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Anagahora, Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan
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  • Kazumi Kato,

    1. National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Anagahora, Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan
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  • Takahiro Hamada

    1. Nanotechnology Research Laboratory, Advanced Technology Research Laboratories, Panasonic Corporation, 3-4 Hikaridai, Seika-cho, Soraku-gun, Kyoto 619-0237, Japan
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Abstract

The unique structure of ZnO films obtained from aqueous solution method was investigated. Scanning electron microscopy (SEM) and X-ray powder diffraction (XRD) analyses indicate that unique morphology and structure of the region where precipitation on the substrate may occur in parallel with other regions. This is accompanied by a decrease of the electrical resistivity in the absorbed region. A possible mechanism for the resistivity transformation was discussed.

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