The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
Version of Record online: 7 JUN 2010
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 207, Issue 8, pages 1845–1849, August 2010
How to Cite
Lee, S., Bang, S., Park, J., Park, S., Jeong, W. and Jeon, H. (2010), The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition. Phys. Status Solidi A, 207: 1845–1849. doi: 10.1002/pssa.200925514
- Issue online: 18 AUG 2010
- Version of Record online: 7 JUN 2010
- Manuscript Accepted: 1 DEC 2009
- Manuscript Revised: 28 NOV 2009
- Manuscript Received: 9 OCT 2009
- Korea Research Foundation, Korean Government (MOEHRD, Basic Research Promotion Fund). Grant Number: KRF-2006-005-J04012
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