Original Paper
Structural characterization of thick (1122) GaN layers grown by HVPE on m-plane sapphire
Article first published online: 26 MAY 2010
DOI: 10.1002/pssa.200983655
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Usikov, A., Soukhoveev, V., Shapovalov, L., Syrkin, A., Ivantsov, V., Scanlan, B., Nikiforov, A., Strittmatter, A., Johnson, N., Zheng, J.-G., Spiberg, P. and El-Ghoroury, H. (2010), Structural characterization of thick (1122) GaN layers grown by HVPE on m-plane sapphire. physica status solidi (a), 207: 1295–1298. doi: 10.1002/pssa.200983655
Publication History
- Issue published online: 14 JUN 2010
- Article first published online: 26 MAY 2010
- Manuscript Accepted: 26 JAN 2010
- Manuscript Revised: 22 JAN 2010
- Manuscript Received: 6 NOV 2009
- Abstract
- Article
- References
- Cited By
Keywords:
- cathodoluminescence;
- dislocations;
- GaN;
- HVPE;
- laser;
- quantum wells;
- structure
Abstract
This paper reports structural characterization of thick
-oriented GaN layers by means of XRD, TEM, and micro- CL. The semi-polar
GaN layers were grown on m-plane sapphire substrates by HVPE. Their structural quality improved with thickness. Threading dislocation density of 3 × 108 cm−2 and stacking faults density of 4 × 104 cm−1 were measured at the surface of 20 µm thick
GaN layers. The semi-polar GaN layers were used as template substrates to grow InGaN/GaN MQW heterostructures by MOCVD that demonstrated optically pumped lasing at 500 nm wavelength. The results demonstrate the longest wavelength yet reported for a photo-pumped laser on template substrates.

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