Novel etch process to tune crater size on magnetron sputtered ZnO:Al
Article first published online: 15 OCT 2010
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 208, Issue 1, pages 109–113, January 2011
How to Cite
Owen, J. I., Hüpkes, J., Zhu, H., Bunte, E. and Pust, S. E. (2011), Novel etch process to tune crater size on magnetron sputtered ZnO:Al. Phys. Status Solidi A, 208: 109–113. doi: 10.1002/pssa.201026164
- Issue published online: 12 JAN 2011
- Article first published online: 15 OCT 2010
- Manuscript Accepted: 19 SEP 2010
- Manuscript Revised: 14 SEP 2010
- Manuscript Received: 30 MAR 2010
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