Local structural modifications of the HfO2 layer in the Al2O3 capped high-k dielectric films as probed by EXAFS
Article first published online: 22 MAR 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 209, Issue 4, pages 679–682, April 2012
How to Cite
Sahiner, M. A., Lysaght, P. S., Woicik, J. C., Park, C. S., Huang, J., Bersuker, G., Taylor, W., Kirsch, P. D. and Jammy, R. (2012), Local structural modifications of the HfO2 layer in the Al2O3 capped high-k dielectric films as probed by EXAFS. Phys. Status Solidi A, 209: 679–682. doi: 10.1002/pssa.201100669
- Issue published online: 29 MAR 2012
- Article first published online: 22 MAR 2012
- Manuscript Accepted: 1 MAR 2012
- Manuscript Revised: 29 FEB 2012
- Manuscript Received: 29 SEP 2011
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