Nano-scale textures are formed on crystalline silicon surfaces by using a two-step electroless wet-chemical method consisting of a treatment in an activated Na2S2O8 (K2S2O8) solution for localized oxidation/surface reaction and silver nanoparticles deposition. The oxidation/reaction products are etched in an aqueous solution of HF and H2O2 assisted by the presence of silver nanoparticles. The reflectance of the nanotextured silicon wafer surfaces less than 5% in the spectral interval 300–900 nm is observed. It was found that the surface texture can withstand without significantly changing the high-temperature solar cell processing. A weighted reflectance of 9.5% and 16.43% efficiency are obtained on nanotextured mc-Si solar cells with an active area of 146 mm2 prepared using the standard screen-printing technique.