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Nanotextured crystalline silicon solar cells

Authors

  • Dimitre Z. Dimitrov,

    Corresponding author
    1. Green Energy Laboratories, R 100, Industrial Technology Research Institute, Rm. 402, Bldg. 78, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan 310, Taiwan
    • Phone: +886-3-5915987, Fax: +886-3-5822157
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  • Ching-Hsi Lin,

    1. Green Energy Laboratories, R 100, Industrial Technology Research Institute, Rm. 402, Bldg. 78, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan 310, Taiwan
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  • Chen-Hsun Du,

    1. Green Energy Laboratories, R 100, Industrial Technology Research Institute, Rm. 402, Bldg. 78, 195, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan 310, Taiwan
    2. National Tsing Hua University, Institute of NanoEngineering and MicroSystems, Rm. 515, Engineering Bldg. 1, No. 101, Sec. 2, Kuang-Fu Rd., Hsinchu, Taiwan 310, Taiwan
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  • Chung-Wen Lan

    1. Department of Chemical Engineering, National Taiwan University, Taipei 101, Taiwan
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Abstract

Nano-scale textures are formed on crystalline silicon surfaces by using a two-step electroless wet-chemical method consisting of a treatment in an activated Na2S2O8 (K2S2O8) solution for localized oxidation/surface reaction and silver nanoparticles deposition. The oxidation/reaction products are etched in an aqueous solution of HF and H2O2 assisted by the presence of silver nanoparticles. The reflectance of the nanotextured silicon wafer surfaces less than 5% in the spectral interval 300–900 nm is observed. It was found that the surface texture can withstand without significantly changing the high-temperature solar cell processing. A weighted reflectance of 9.5% and 16.43% efficiency are obtained on nanotextured mc-Si solar cells with an active area of 146 mm2 prepared using the standard screen-printing technique.

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