The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
Article first published online: 15 NOV 2011
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 209, Issue 2, pages 302–305, February 2012
How to Cite
Park, T., Choi, D., Choi, H. and Jeon, H. (2012), The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2. Phys. Status Solidi A, 209: 302–305. doi: 10.1002/pssa.201127280
- Issue published online: 25 JAN 2012
- Article first published online: 15 NOV 2011
- Manuscript Accepted: 24 OCT 2011
- Manuscript Revised: 31 AUG 2011
- Manuscript Received: 12 MAY 2011
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