Original Paper

Growth rate enhancement of liquid phase deposited nickel oxide film on ITO/glass under UV photo-irradiation

  1. Ming-Kwei Lee*,
  2. Cho-Han Fan

Article first published online: 23 JAN 2012

DOI: 10.1002/pssa.201127322

Issue

physica status solidi (a)

physica status solidi (a)

Volume 209, Issue 4, pages 702–707, April 2012

Additional Information

How to Cite

Lee, M.-K. and Fan, C.-H. (2012), Growth rate enhancement of liquid phase deposited nickel oxide film on ITO/glass under UV photo-irradiation. Phys. Status Solidi A, 209: 702–707. doi: 10.1002/pssa.201127322

Author Information

  1. Department of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 80424, Taiwan

*Phone: 886 7 5252000, ext: 4120, Fax: 886 7 5254199

Publication History

  1. Issue published online: 29 MAR 2012
  2. Article first published online: 23 JAN 2012
  3. Manuscript Accepted: 1 JAN 2012
  4. Manuscript Revised: 19 DEC 2011
  5. Manuscript Received: 2 JUN 2011

Funded by

  • National Science Council of the Republic of China. Grant Number: NSC97-2221-E-110-073-MY3

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