Three-step growth method for high quality AlN epilayers
Article first published online: 21 OCT 2011
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 209, Issue 1, pages 126–129, January 2012
How to Cite
Nakarmi, M. L., Cai, B., Lin, J. Y. and Jiang, H. X. (2012), Three-step growth method for high quality AlN epilayers. Phys. Status Solidi A, 209: 126–129. doi: 10.1002/pssa.201127475
- Issue published online: 15 DEC 2011
- Article first published online: 21 OCT 2011
- Manuscript Accepted: 10 OCT 2011
- Manuscript Revised: 29 SEP 2011
- Manuscript Received: 9 AUG 2011
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