Copper oxide thin films by chemical vapor deposition: Synthesis, characterization and electrical properties
Article first published online: 9 DEC 2011
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 209, Issue 3, pages 531–536, March 2012
How to Cite
Eisermann, S., Kronenberger, A., Laufer, A., Bieber, J., Haas, G., Lautenschläger, S., Homm, G., Klar, P. J. and Meyer, B. K. (2012), Copper oxide thin films by chemical vapor deposition: Synthesis, characterization and electrical properties. Phys. Status Solidi A, 209: 531–536. doi: 10.1002/pssa.201127493
- Issue published online: 27 FEB 2012
- Article first published online: 9 DEC 2011
- Manuscript Accepted: 22 NOV 2011
- Manuscript Revised: 21 NOV 2011
- Manuscript Received: 18 AUG 2011
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