Iron segregation in silicon-on-insulator wafer with polysilicon interlayer
Article first published online: 13 FEB 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 209, Issue 4, pages 724–726, April 2012
How to Cite
Yli-Koski, M., Haarahiltunen, A., Hintsala, J. and Savin, H. (2012), Iron segregation in silicon-on-insulator wafer with polysilicon interlayer. Phys. Status Solidi A, 209: 724–726. doi: 10.1002/pssa.201127718
- Issue published online: 29 MAR 2012
- Article first published online: 13 FEB 2012
- Manuscript Accepted: 20 JAN 2012
- Manuscript Revised: 19 JAN 2012
- Manuscript Received: 7 DEC 2011
- Finnish National Technology Agency
- Academy of Finland
- Okmetic Oyj
- Endeas Oy
- Semilab Inc.
- VTI Technologies Oy
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