Preparation of epitaxial films of the transparent conductive oxide Al:ZnO by reactive high-pressure sputtering in Ar/O2 mixtures
Article first published online: 5 MAR 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 210, Issue 5, pages 1013–1018, May 2013
How to Cite
Van Gompel, M., Conings, B., Jiménez Monroy, K. L., D‘Haen, J., Gilissen, K., D‘Olieslaeger, M., Van Bael, M. K. and Wagner, P. (2013), Preparation of epitaxial films of the transparent conductive oxide Al:ZnO by reactive high-pressure sputtering in Ar/O2 mixtures. Phys. Status Solidi A, 210: 1013–1018. doi: 10.1002/pssa.201200986
- Issue published online: 17 MAY 2013
- Article first published online: 5 MAR 2013
- Manuscript Accepted: 7 FEB 2013
- Manuscript Revised: 6 FEB 2013
- Manuscript Received: 22 DEC 2012
- University, the Methusalem network NANO Antwerp
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