Multiphonon ionization of traps formed in hafnium oxide by electrical stress
Article first published online: 22 NOV 2012
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 210, Issue 2, pages 361–366, February 2013
How to Cite
Danilyuk, A. L., Migas, D. B., Danilyuk, M. A., Borisenko, V. E., Wu, X., Raghavan, N. and Pey, K. L. (2013), Multiphonon ionization of traps formed in hafnium oxide by electrical stress. Phys. Status Solidi A, 210: 361–366. doi: 10.1002/pssa.201228083
- Issue published online: 15 FEB 2013
- Article first published online: 22 NOV 2012
- Manuscript Accepted: 2 OCT 2012
- Manuscript Revised: 1 OCT 2012
- Manuscript Received: 7 FEB 2012
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