High-performance a-SiGe:H thin film prepared by plasma-enhanced chemical vapor deposition with high plasma power for solar-cell application
Article first published online: 10 OCT 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 209, Issue 12, pages 2527–2531, December 2012
How to Cite
Yan, B., Zhao, L., Zhao, B., Chen, J., Wang, G., Diao, H. and Wang, W. (2012), High-performance a-SiGe:H thin film prepared by plasma-enhanced chemical vapor deposition with high plasma power for solar-cell application. Phys. Status Solidi A, 209: 2527–2531. doi: 10.1002/pssa.201228281
- Issue published online: 12 DEC 2012
- Article first published online: 10 OCT 2012
- Manuscript Accepted: 14 SEP 2012
- Manuscript Revised: 17 AUG 2012
- Manuscript Received: 3 MAY 2012
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