Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes
Article first published online: 30 JAN 2013
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Special Issue: Advanced Concepts for Silicon Based Photovoltaics
Volume 210, Issue 4, pages 796–801, April 2013
How to Cite
Alvarez, R., Romero-Gomez, P., Gil-Rostra, J., Cotrino, J., Yubero, F., Gonzalez-Elipe, A. R. and Palmero, A. (2013), Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes. Phys. Status Solidi A, 210: 796–801. doi: 10.1002/pssa.201228656
- Issue published online: 4 APR 2013
- Article first published online: 30 JAN 2013
- Manuscript Accepted: 8 JAN 2013
- Manuscript Revised: 10 DEC 2012
- Manuscript Received: 26 SEP 2012
- Ministry of Economy and Competitiveness (CONSOLIDER CSD2008-00023, MAT2010-21228, and MAT2010-18447)
As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors.
Please note: Wiley Blackwell is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.