Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
Version of Record online: 25 OCT 2012
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 210, Issue 2, pages 276–284, February 2013
How to Cite
Lee, J., Lee, S. J., Han, W. B., Jeon, H., Park, J., Jang, W., Yoon, C. S. and Jeon, H. (2013), Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition. Phys. Status Solidi A, 210: 276–284. doi: 10.1002/pssa.201228671
- Issue online: 15 FEB 2013
- Version of Record online: 25 OCT 2012
- Manuscript Accepted: 5 OCT 2012
- Manuscript Revised: 19 SEP 2012
- Manuscript Received: 4 APR 2012
- Korean government (MEST). Grant Number: 2011-0015436
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