Diamond nanopillars with diameters of 1 μm down to 50 nm have been fabricated from two types of diamond thin films, namely nanocrystalline diamond (NCD) and ultrananocrystalline diamond (UNCD) using electron beam lithography (EBL) and reactive ion etching (RIE) in an inductively coupled oxygen plasma (ICP). Aim of the study was to investigate the suitability of these pillars to incorporate nitrogen-vacancy (NV) color centers for applications in quantum information technology (QIT). The first part of the investigation is devoted to a characterization of the pillars, their shape, size, and properties. The second part of this investigation concerns the optical properties of NCD and UNCD nanopillars and the incorporation of NV centers within them. Among others, fluorescence mapping and photoluminescence measurements have been employed for this purpose. It turned out that NCD pillars are quite promising for the applications in QIT envisioned. At the present time, the opposite is the case for UNCD pillars. The reasons for these differences will be discussed on the basis of the differences of the two materials NCD and UNCD.