In situ excimer laser irradiation as cleaning tool for solid phase epitaxy of laser crystallized polycrystalline silicon thin films
Article first published online: 20 OCT 2013
© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 210, Issue 12, pages 2729–2735, December 2013
How to Cite
Höger, I., Schmidt, T., Landgraf, A., Schade, M., Gawlik, A., Andrä, G., Leipner, H. S. and Falk, F. (2013), In situ excimer laser irradiation as cleaning tool for solid phase epitaxy of laser crystallized polycrystalline silicon thin films. Phys. Status Solidi A, 210: 2729–2735. doi: 10.1002/pssa.201330056
- Issue published online: 11 DEC 2013
- Article first published online: 20 OCT 2013
- Manuscript Accepted: 19 SEP 2013
- Manuscript Revised: 18 SEP 2013
- Manuscript Received: 17 JUN 2013
- Max-Planck-Institut für Mikrostrukturphysik Halle
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