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    Lauri Aarik, Tõnis Arroval, Raul Rammula, Hugo Mändar, Väino Sammelselg, Boris Hudec, Kristína Hušeková, Karol Fröhlich, Jaan Aarik, Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors, Thin Solid Films, 2014, 565, 19

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