Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
Version of Record online: 20 OCT 2013
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 211, Issue 2, pages 416–424, February 2014
How to Cite
Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser, E., Havenith, M., Wieck, A. D., de los Arcos, T., Fischer, Roland. A. and Devi, A. (2014), Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition. Phys. Status Solidi A, 211: 416–424. doi: 10.1002/pssa.201330115
- Issue online: 14 FEB 2014
- Version of Record online: 20 OCT 2013
- Manuscript Accepted: 19 SEP 2013
- Manuscript Revised: 17 SEP 2013
- Manuscript Received: 10 JUL 2013
- European Community's Seventh Framework Programme (FP7/2007-2013). Grant Number: ENHANCE-238409
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