MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
Article first published online: 13 NOV 2013
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (a)
Volume 211, Issue 2, pages 260–266, February 2014
How to Cite
Srinivasan, N. B., Thiede, T. B., de los Arcos, T., Rogalla, D., Becker, H.-W., Devi, A. and Fischer, R. A. (2014), MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. Phys. Status Solidi A, 211: 260–266. doi: 10.1002/pssa.201330127
- Issue published online: 14 FEB 2014
- Article first published online: 13 NOV 2013
- Manuscript Revised: 17 OCT 2013
- Manuscript Accepted: 17 OCT 2013
- Manuscript Received: 12 JUL 2013
- European Community's Seventh Framework Programme (FP7/2007-2013). Grant Number: ENHANCE-238409
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