Katharina Brassat, Fabian Assion, Ulrich Hilleringmann and Jörg K. N. Lindner
Self-organization of small objects is an effective approach of creating ordered nanostructures on a surface. On planar surfaces, nanosphere lithography (NSL) has recently attracted much attention, as it allows to rapidly create large-area nanopatterns on any wettable material at low cost. In NSL, spheres from a colloidal suspension are typically self-arranged in a hexagonally close-packed mono- or double-layer on a surface and the open spaces in between each triple of neighboring spheres serve as mask openings, where the subjacent substrate can be modifi ed by materials deposition or removal. Thus, NSL enables the fabrication of nanopatterned surfaces with good control of the size of surface features, their shape, density and order. On page 1485–1489, Brassat et al. show that using a spreading knife technique, spheres can also be arranged within linear trenches on silicon, where a self-organized molecular monolayer helps to suppress sphere deposition outside the trenches. The SEM image shows a double row of spheres in a trench in a cross-section view. The resulting nanostructures are assumed to pave the way to combine microfl uidics and nanoplasmonics in future devices.