Reactions on the SiC(0001) √3 × √3 R30° surface after Ti deposition and annealing
Version of Record online: 15 JUL 2010
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (b)
Volume 248, Issue 3, pages 667–673, March 2011
How to Cite
Johansson, L. I. and Virojanadara, C. (2011), Reactions on the SiC(0001) √3 × √3 R30° surface after Ti deposition and annealing. Phys. Status Solidi B, 248: 667–673. doi: 10.1002/pssb.201046175
- Issue online: 21 FEB 2011
- Version of Record online: 15 JUL 2010
- Manuscript Accepted: 11 JUN 2010
- Manuscript Revised: 9 JUN 2010
- Manuscript Received: 9 APR 2010
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