Contributed Article
GaN layer growth by HVPE on m-plane sapphire substrates
Article first published online: 26 MAY 2009
DOI: 10.1002/pssc.200880889
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Issue
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physica status solidi (c)
Supplement: International Workshop on Nitride Semiconductors (IWN 2008), see additional papers in Phys. Status Solidi A 206, No. 6 (2009) and Phys. Status Solidi B 246, No. 6 (2009)
Volume 6, Issue Supplement 2, pages S321–S324, June 2009
Additional Information
How to Cite
Usikov, A., Shapovalov, L., Ivantsov, V., Kovalenkov, O., Syrkin, A., Spiberg, P. and Brown, R. (2009), GaN layer growth by HVPE on m-plane sapphire substrates. physica status solidi (c), 6: S321–S324. doi: 10.1002/pssc.200880889
Publication History
- Issue published online: 26 MAY 2009
- Article first published online: 26 MAY 2009
- Manuscript Accepted: 12 MAR 2009
- Manuscript Revised: 11 MAR 2009
- Manuscript Received: 10 SEP 2008
- Abstract
- Cited By
Keywords:
- 61.05.cp;
- 68.55.ag;
- 73.61.Ey;
- 78.55.Et;
- 81.05.Ea
Abstract
Semipolar GaN layers were grown on m-plane sapphire substrates by HVPE. Insertion of AlxGa1–xN (x ∼ 0.1-0.6) layer in-between m-plane sapphire substrate and GaN layer promoted to improve crystalline quality and to grow of semipolar (11-22) plane GaN layers. X-ray diffraction (11-22) ω-scan rocking curve FWHM of 298 arcsec was measured for a 30 μm thick (11-22) GaN layer. Depending on growth conditions, m-plane GaN layer having micro-crystallites of other orientations (mainly of (11-24) plane GaN layer) was also grown. (© 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

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