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Keywords:

  • 61.05.cp;
  • 68.55.ag;
  • 73.61.Ey;
  • 78.55.Et;
  • 81.05.Ea

Abstract

Semipolar GaN layers were grown on m-plane sapphire substrates by HVPE. Insertion of AlxGa1–xN (x ∼ 0.1-0.6) layer in-between m-plane sapphire substrate and GaN layer promoted to improve crystalline quality and to grow of semipolar (11-22) plane GaN layers. X-ray diffraction (11-22) ω-scan rocking curve FWHM of 298 arcsec was measured for a 30 μm thick (11-22) GaN layer. Depending on growth conditions, m-plane GaN layer having micro-crystallites of other orientations (mainly of (11-24) plane GaN layer) was also grown. (© 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)