Development of high-quality titanium-doped gallium ZnO transparent conductive films by RF magnetron sputtering techniques



In this paper, Ti-doped GaZnO (GTZO) transparent conductive oxide (TCO) was deposited by radio-frequency magnetron sputtering on glass substrates. X-ray diffraction (XRD) of the crystalline quality of the resulting GTZO TCO showed a (002) peak with increased intensity for films deposited with annealing temperature from as-grown to 450 °C. The low thin film resistivity of 1.57 × 10-4 Ω-cm, and average optical transmittance of 91% in the range between 350 and 800 nm, are also demonstrated to show the potential applications of this work. (© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)