Microstructured horizontal alumina pore arrays as growth templates for large area few and single nanowire devices



We demonstrate the fabrication of horizontally aligned and well-defined nanopore structures by anodic oxidation of aluminum thin films and micro stripes on a Si substrate. We are able to control both, the pore diameters and interpore distances from 10 nm to 130 nm and from 30 nm to 275 nm, respectively. The anisotropy of the system induces some deviations in the pore configuration from the typical honeycomb structure. By decreasing the dimensions of the Al structures, the final pore diameter and interpore distance remains constant, enabling the transition from multiple to a few nanowire porous structures. Finally, we successfully filled the nanopores by pulsed electroplating, as demonstrated both by Scanning Electron Microscopy and by current–voltage measurements. Having full control over the size, the density, the position and the orientation of the porous structure, our approach is promising for many exciting applications, including nanoelectronics and sensing. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)