Rapid Research Letter
Reduction of charge trapping in HfO2 film on a Ge substrate by trimethylaluminum pretreatment
Article first published online: 4 OCT 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
physica status solidi (RRL) - Rapid Research Letters
Volume 6, Issue 11, pages 439–441, November 2012
How to Cite
Lee, J. J., Shin, Y., Choi, J., Kim, H., Hyun, S., Choi, S., Cho, B. J. and Lee, S.-H. (2012), Reduction of charge trapping in HfO2 film on a Ge substrate by trimethylaluminum pretreatment. Phys. Status Solidi RRL, 6: 439–441. doi: 10.1002/pssr.201206315
- Issue published online: 13 NOV 2012
- Article first published online: 4 OCT 2012
- Manuscript Accepted: 26 SEP 2012
- Manuscript Revised: 14 SEP 2012
- Manuscript Received: 23 JUL 2012
- Center for Integrated Smart Sensors (funded by the Ministry of Education, Science and Technology). Grant Number: Global Frontier Project CISS-2011-0031848
- Samsung's industrial education cooperation program
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