The effect of ionization and CH3 ligand for hydrogen storage in Co- and Ni-based organometallic compounds



Maximum capacities of the hydrogen storage in organometallic compounds consisting of Co and Ni atoms bound to CmHm ring (m = 4, 5; capped type) were, respectively, found as 3.48 and 3.49 wt % (Guo et al., Struct Chem, 2009, 20, 1107). Here, we extend this study to structures having a transition metal (TM) inserted in CmHm ring (inserted type), having TM located on either a C4Hmath image or a C5Hmath image molecule, and the CH3 ligand bound to the organometallic compounds. We find that for the CoC4H4 and NiC4H4 complexes, the capped types are 1.39 eV and 1.41 eV higher in energy than the inserted types, respectively, while the ground states for CoC5H5 and NiC5H5 complexes are found to be the capped type, which are lower than the inserted types, respectively, by 1.27 eV and 1.31 eV. The maximum capacity of hydrogen storage reached 5.13 wt % for both of CoC4Hmath image(H2)3 complex and the inserted-type CoC4H4(H2)3 complex with a reasonable binding energy (0.3–1.0 eV per H2). The positively charged C4H4 and C5H5 molecules do not only improve the capacity of hydrogen storage but also make all H2 adsorbing in molecular form and keep the adsorption energy in an ideal range. After adding the CH3 ligand to the compounds, the average adsorption energy of H2 decreased to an ideal range 0.61–0.94 eV per H2 and the stability of the compounds is also improved. Finally, we analyze the HOMO–LUMO gaps and display the kinetic stability when H2 was added to organometallic compounds. © 2010 Wiley Periodicals, Inc. Int J Quantum Chem, 2010