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Ab initio chemical kinetics for reactions of H atoms with SiHx (x = 1–3) radicals and related unimolecular decomposition processes

  1. Putikam Raghunath1,
  2. Yun-Min Lee2,
  3. Shang-Ying Wu2,
  4. Jong-Shinn Wu2,
  5. Ming-Chang Lin1,*

Article first published online: 22 FEB 2013

DOI: 10.1002/qua.24396

Issue

International Journal of Quantum Chemistry

International Journal of Quantum Chemistry

Volume 113, Issue 12, pages 1735–1746, 15 June 2013

Additional Information

How to Cite

Raghunath, P., Lee, Y.-M., Wu, S.-Y., Wu, J.-S. and Lin, M.-C. (2013), Ab initio chemical kinetics for reactions of H atoms with SiHx (x = 1–3) radicals and related unimolecular decomposition processes. Int. J. Quantum Chem., 113: 1735–1746. doi: 10.1002/qua.24396

Author Information

  1. 1

    Center for Interdisciplinary Molecular Science, Department of Applied Chemistry, National Chiao Tung University, Hsinchu 300, Taiwan

  2. 2

    Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan

*Center for Interdisciplinary Molecular Science, Department of Applied Chemistry, National Chiao Tung University, Hsinchu 300, Taiwan

Publication History

  1. Issue published online: 6 MAY 2013
  2. Article first published online: 22 FEB 2013
  3. Manuscript Accepted: 21 DEC 2012
  4. Manuscript Revised: 12 DEC 2012
  5. Manuscript Received: 13 SEP 2012

Funded by

  • Taiwan's National Science Council (NSC). Grant Number: NSC100-2113-M-009-013
  • Ministry of Economics. Grant Number: 98-EC-17-A-07-S2-0043

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