Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size-selected Ar gas-cluster ion projectiles

Authors

  • Motohiro Tanaka,

    1. Department of Mechanical and System Engineering, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
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  • Kousuke Moritani,

    Corresponding author
    1. Department of Mechanical and System Engineering, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
    • Department of Mechanical and System Engineering, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan.
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  • Tomokazu Hirota,

    1. Incubation Center, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo, 671-2201, Japan
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  • Noriaki Toyoda,

    1. Incubation Center, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo, 671-2201, Japan
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  • Isao Yamada,

    1. Incubation Center, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo, 671-2201, Japan
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  • Norio Inui,

    1. Department of Mechanical and System Engineering, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
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  • Kozo Mochiji

    1. Department of Mechanical and System Engineering, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan
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Abstract

A size-selected argon (Ar) gas-cluster ion beam (GCIB) was applied to the secondary ion mass spectrometry (SIMS) of a 1,4-didodecylbenzene (DDB) thin film. The samples were also analyzed by SIMS using an atomic Ar+ ion projectile and X-ray photoelectron spectroscopy (XPS). Compared with those in the atomic-Ar+ SIMS spectrum, the fragment species, including siloxane contaminants present on the sample surface, were enhanced several hundred times in the Ar gas-cluster SIMS spectrum. XPS spectra during beam irradiation indicate that the Ar GCIB sputters contaminants on the surface more effectively than the atomic Ar+ ion beam. These results indicate that a large gas-cluster projectile can sputter a much shallower volume of organic material than small projectiles, resulting in an extremely surface-sensitive analysis of organic thin films. Copyright © 2010 John Wiley & Sons, Ltd.

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