A high-throughput system for boron microsublimation and isotope analysis by total evaporation thermal ionization mass spectrometry
Article first published online: 27 JUN 2013
Copyright © 2013 John Wiley & Sons, Ltd.
Rapid Communications in Mass Spectrometry
Volume 27, Issue 15, pages 1705–1714, 15 August 2013
How to Cite
Liu, Y.-W., Aciego, S. M., Wanamaker, A. D. and Sell, B. K. (2013), A high-throughput system for boron microsublimation and isotope analysis by total evaporation thermal ionization mass spectrometry. Rapid Commun. Mass Spectrom., 27: 1705–1714. doi: 10.1002/rcm.6619
- Issue published online: 20 JUN 2013
- Article first published online: 27 JUN 2013
- Manuscript Accepted: 3 MAY 2013
- Manuscript Revised: 16 APR 2013
- Manuscript Received: 27 FEB 2013
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