Design of a contact probe with high positioning accuracy for plasmonic lithography
Article first published online: 28 MAR 2011
Copyright © 2011 Wiley Periodicals, Inc.
Volume 33, Issue 2, pages 99–105, March/April 2011
How to Cite
Jang, J., Kim, Y., Kim, S., Jung, H. and Hahn, J. W. (2011), Design of a contact probe with high positioning accuracy for plasmonic lithography. Scanning, 33: 99–105. doi: 10.1002/sca.20228
- Issue published online: 20 APR 2011
- Article first published online: 28 MAR 2011
- Manuscript Accepted: 28 FEB 2011
- Manuscript Received: 27 JAN 2011
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