Conflicts of interest: None.
Challenging material patterning: Fine lithography on coarse substrates
Article first published online: 29 OCT 2013
© 2013 Wiley Periodicals, Inc.
Volume 36, Issue 3, pages 362–367, May/June 2014
How to Cite
Gilles, S., Steppert, A.-K., Schaal, P. A., Barth, M., Niewoehner, L. and Simon, U. (2014), Challenging material patterning: Fine lithography on coarse substrates. Scanning, 36: 362–367. doi: 10.1002/sca.21126
- Issue published online: 4 JUN 2014
- Article first published online: 29 OCT 2013
- Manuscript Accepted: 2 OCT 2013
- Manuscript Revised: 23 SEP 2013
- Manuscript Received: 22 JUL 2013
- Deutsche Forschungsgemeinschaft. Grant Number: Si609/10-1
- dip-pen nanolithography;
- forensic science;
- gunshot residues
Precise patterning of inorganic materials is important for many technological applications. Often lithography processes are required on challenging substrates with respect to topography, flexibility, and surface adhesion. Here we show the fabrication of artificial gunshot residues (GSR) on adhesive tape samples by means of dip-pen lithography as an example for fine lithography on coarse substrates. We deposited lead-, barium-, and antimony-containing inks on SEM adhesive tape by direct writing with a fine tip. Single as well as multiple element structures with dimensions in the range of 10–75 µm were fabricated. SCANNING 36:362–367, 2014. © 2013 Wiley Periodicals, Inc.