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Challenging material patterning: Fine lithography on coarse substrates

Authors

  • Sandra Gilles,

    1. Institute of Inorganic Chemistry, RWTH Aachen University, Aachen, Germany
    2. JARA—Fundamentals of Future Information Technology, RWTH Aachen University, Aachen, Germany
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  • Ann-Kathrin Steppert,

    1. Institute of Inorganic Chemistry, RWTH Aachen University, Aachen, Germany
    2. JARA—Fundamentals of Future Information Technology, RWTH Aachen University, Aachen, Germany
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  • Patrick A. Schaal,

    1. Institute of Inorganic Chemistry, RWTH Aachen University, Aachen, Germany
    2. JARA—Fundamentals of Future Information Technology, RWTH Aachen University, Aachen, Germany
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  • Martin Barth,

    1. Bundeskriminalamt, Forensic Science Institute, Wiesbaden, Germany
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  • Ludwig Niewoehner,

    1. Bundeskriminalamt, Forensic Science Institute, Wiesbaden, Germany
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  • Ulrich Simon

    Corresponding author
    1. Institute of Inorganic Chemistry, RWTH Aachen University, Aachen, Germany
    2. JARA—Fundamentals of Future Information Technology, RWTH Aachen University, Aachen, Germany
    • Address for reprints: Ulrich Simon, Institute of Inorganic Chemistry, RWTH Aachen University, 52074 Aachen, Germany

      E-mail: usimon@ac.rwth-aachen.de

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  • Conflicts of interest: None.

Summary

Precise patterning of inorganic materials is important for many technological applications. Often lithography processes are required on challenging substrates with respect to topography, flexibility, and surface adhesion. Here we show the fabrication of artificial gunshot residues (GSR) on adhesive tape samples by means of dip-pen lithography as an example for fine lithography on coarse substrates. We deposited lead-, barium-, and antimony-containing inks on SEM adhesive tape by direct writing with a fine tip. Single as well as multiple element structures with dimensions in the range of 10–75 µm were fabricated. SCANNING 36:362–367, 2014. © 2013 Wiley Periodicals, Inc.

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