Special issue article
Formation of alumina films with nano-dot structures by successive liquid phase deposition, anodizing, and substrate dissolution
Article first published online: 11 FEB 2013
Copyright © 2013 John Wiley & Sons, Ltd.
Surface and Interface Analysis
Special Issue: Aluminium Surface Science and Technology
Volume 45, Issue 10, pages 1510–1516, October 2013
How to Cite
Sakairi, M., Fujita, R., Jha, H. and Kikuchi, T. (2013), Formation of alumina films with nano-dot structures by successive liquid phase deposition, anodizing, and substrate dissolution. Surf. Interface Anal., 45: 1510–1516. doi: 10.1002/sia.5233
- Issue published online: 5 SEP 2013
- Article first published online: 11 FEB 2013
- Manuscript Accepted: 12 JAN 2013
- Manuscript Revised: 5 DEC 2012
- Manuscript Received: 23 JUL 2012
- liquid phase deposition
A process based on successive anodizing, liquid phase deposition (LPD), re-anodizing, and aluminium substrate dissolution to form alumina films with nano-dot structures is demonstrated. Initially, a protective oxide film is formed on the aluminium surface to prevent further dissolution of the aluminium substrate during LPD processing. Because of heterogeneity in the protective oxide film, localized dissolution would otherwise occur under the film, resulting in pit formation during the LPD treatment. During re-anodizing, these pits act as a mold for anodic oxide resembling a nano-dot like structure. Optimization of LPD parameters, such as time and temperature, would make it possible to obtain alumina films with nano-dot structures with sizes smaller than 1 µm. Alumina films with nano-dot structures with hollow can be realized by controlling the LPD conditions. Copyright © 2013 John Wiley & Sons, Ltd.