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Abstract

The interface between diamond-like amorphous hydrogenated carbon (a-C : H) and Al2O3 was analysed by sputter depth profile analysis via x-ray photoelectron spectroscopy. X-ray photoelectron spectra were also recorded during direct ion beam deposition (CH4, E = 400 eV) monitoring the initial build-up of the interface. No stoichiometric interface compound was detected, although Al2O3 is reduced to Al2O3-x (x ∼ 0.5–1) enabling an interaction with the carbon atoms. This results in an excellent adhesion of a-C : H to the chemically inert Al2O3.