Silicon nanowires (SiNWs) with desirable axial crystallographic orientations can be readily prepared by a novel chemical-etching technique (see SEM image). The as-synthesized SiNW arrays significantly suppress reflection over the visible-light spectral range and are therefore promising candidates for antireflection coatings of photovoltaic cells despite exhibiting a lower efficiency than non-nanowire-based devices at this stage of development.
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