Wafer-Scale Ni Imprint Stamps for Porous Alumina Membranes Based on Interference Lithography


  • Financial support from the German Federal Ministry for Education and Research (BMBF, Project No. 03N8701) and the National Science Foundation are greatly acknowledged. We would like to thank Dr. Mato Knez for AFM investigations and Prof. H. I. Smith of MIT for the use of laboratory facilities and valuable discussions.


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Stamp collection: Laser interference lithography can be used for the fabrication of master patterns with precise periodic nanostructures. Multiple copies of Ni imprint stamps can be replicated from a single master by an electrodeposition technique. The replicated stamps have been used for the fabrication of long-range-ordered anodic aluminum oxide membranes with a square or hexagonal pore arrangement (see schematic).