Cover Picture: Massively Parallel Dip-Pen Nanolithography of Heterogeneous Supported Phospholipid Multilayer Patterns (Small 1/2007)

Authors

  • Steven Lenhert Dr.,

    1. Institut für NanoTechnologie, Forschungszentrum Karlsruhe GmbH, 76021 Karlsruhe, Germany, Fax: (+49) 7247-826368
    2. Physikalisches Institut, Universität Münster, 48149 Münster, Germany
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  • Peng Sun,

    1. Department of Chemistry and International Institute for Nanotechnology, Northwestern University, Evanston, IL 60208, USA, Fax: (+1) 847-467-5123
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  • Yuhuang Wang Dr.,

    1. Department of Chemistry and International Institute for Nanotechnology, Northwestern University, Evanston, IL 60208, USA, Fax: (+1) 847-467-5123
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  • Harald Fuchs Prof.,

    1. Institut für NanoTechnologie, Forschungszentrum Karlsruhe GmbH, 76021 Karlsruhe, Germany, Fax: (+49) 7247-826368
    2. Physikalisches Institut, Universität Münster, 48149 Münster, Germany
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  • Chad A. Mirkin Prof.

    1. Department of Chemistry and International Institute for Nanotechnology, Northwestern University, Evanston, IL 60208, USA, Fax: (+1) 847-467-5123
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Abstract

The cover picture illustrates the use of self-organizing phospholipids as an ink for massively parallel dip-pen nanolithography. With this constructive lithographic technique it is possible to build model lipid-membrane patterns with sub-micrometer line widths over square-centimeter surface areas. The ability to pattern and integrate different membrane components opens many new possibilities in the fabrication of model systems that seek to simulate the chemical and structural complexity of biological membranes. For more information, please read the Communication “Massively Parallel Dip-Pen Nanolithography of Heterogeneous Supported Phospholipid Multilayer Patterns” by S. Lenhert, C. A. Mirkin, and co-workers on page 71. (Jacob Ciszek and Matthew Banholzer are gratefully acknowledged for the three-dimensional schematic in the cover picture.)

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