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Full Paper
Fabrication of Molecular Nanotemplates in Self-Assembled Monolayers by Extreme-Ultraviolet-Induced Chemical Lithography
Article first published online: 25 OCT 2007
DOI: 10.1002/smll.200700516
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Turchanin, A., Schnietz, M., El-Desawy, M., Solak, Harun H., David, C. and Gölzhäuser, A. (2007), Fabrication of Molecular Nanotemplates in Self-Assembled Monolayers by Extreme-Ultraviolet-Induced Chemical Lithography. Small, 3: 2114–2119. doi: 10.1002/smll.200700516
Publication History
- Issue published online: 4 DEC 2007
- Article first published online: 25 OCT 2007
- Manuscript Received: 10 JUL 2007
Funded by
- BMBF
- DFG
- Abstract
- Article
- References
- Cited By
Keywords:
- biomimetics;
- chemical nanopatterns;
- molecular engineering;
- nanolithography;
- self-assembled monolayers
Abstract
Extreme-UV interference lithography (EUV-IL) is applied to create chemical nanopatterns in self-assembled monolayers (SAMs) of 4′-nitro-1,1′-biphenyl-4-thiol (NBPT) on gold. X-ray photoelectron spectroscopy shows that EUV irradiation induces both the conversion of the terminal nitro groups of NBPT into amino groups and the lateral crosslinking of the underlying aromatic cores. Large-area (≈2 mm2) nitro/amino chemical patterns with periods ranging from 2000 nm to 60 nm can be generated. Regions of pristine NBPT on the exposed samples are exchanged with protein-resistant thiol SAMs of polyethyleneglycol, resulting in the formation of molecular nanotemplates, which can serve as the basis of complex biomimetic surfaces.